Effect of Substrate on Structural, optical and electrical properties of CuCrO2 nanothinfims by Reactive dc magnetron sputtering

Authors

  • C.C. Mohan Reddy Department of Physics,AITS,Rajampet,Kadapa-516126
  • K. Ramesh Krishna Department of Physics,AITS,Rajampet,Kadapa-516126
  • L. Obulapathi Department of Physics,AITS,Rajampet,Kadapa-516126

Keywords:

CuCrO2 thin films,GAXRD, delafossite structure, SEM, band gap and resistivity

Abstract

Copper chromium oxide thin films have been deposited on glass, sapphire and mica substrates by dc magnetron sputtering method at substrate temperature 2000C. The structural analysis of the deposited films with GAXRD shows the (0 1 2) prominent reflection peak of CuCrO2 with vertical to c-axis as delafossite structure and surface morphology was studied by SEM. The optical and electrical properties of the films were studied by UV-Vis spectroscopy and Four probe resistivity measurements. The optical Transmission curves reveal that the film deposited on glass substrate has high transmittance with maximum band gap energy Eg 3.02 eV. The electrical resistivity values were found minimum in sapphire

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Published

2018-08-22

How to Cite

Reddy , C. M. ., Krishna, K. R. ., & Obulapathi, L. (2018). Effect of Substrate on Structural, optical and electrical properties of CuCrO2 nanothinfims by Reactive dc magnetron sputtering. International Journal of Technical Innovation in Modern Engineering & Science, 4(8), 704–710. Retrieved from https://ijtimes.com/index.php/ijtimes/article/view/967

Issue

Vol. 4 No. 8 (2018): Vol. 4 No. 8: Volume 4 Issue 8 (August-2018)

Section

Articles